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首页> 外文期刊>Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic >Studies on surface deformation of copper sulphide thin films by holographic interferometry technique
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Studies on surface deformation of copper sulphide thin films by holographic interferometry technique

机译:全息干涉技术研究硫化铜薄膜的表面变形

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摘要

Holographic interferometry technique used to study the surface deformation of electrodeposited copper sulphide thin films on stainless steel substrate is here presented. It is concerned with the formation and interpretation of fringe patterns, which appears when a wave generated at some earlier time and stored in a hologram is later reconstructed by interfering with comparison wave. The proposed technique uses double exposure holographic interferometry (DEHI) together with simple mathematical relation, which allows immediate finding of stress, mass deposited and thickness of thin film. It must be further noted that, fringe spacing changes with time of deposition as well as solution concentration. The structural study (XRD) is carried out for the confirmation.
机译:本文介绍了用于研究不锈钢基板上电沉积硫化铜薄膜表面变形的全息干涉技术。它与条纹图案的形成和解释有关,条纹图案的出现和解释是在较早时间生成并存储在全息图中的波后来通过干扰比较波而重建时出现的。所提出的技术将二次曝光全息干涉术(DEHI)与简单的数学关系一起使用,可以立即发现应力,沉积的质量和薄膜的厚度。还必须注意,条纹间距随沉积时间以及溶液浓度而变化。进行结构研究(XRD)进行确认。

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