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首页> 外文期刊>Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic >Simulation and fabrication study of porous silicon photonic crystal
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Simulation and fabrication study of porous silicon photonic crystal

机译:多孔硅光子晶体的仿真与制备研究

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摘要

The present work reports design and fabrication of porous silicon based one-dimensional (1D) photonic crystal. Distributed Bragg reflector (DBR) is a 1D photonic crystal composed of multilayer stack of high and low refractive index layers. Design of porous silicon DBR is a complex one and requires appropriate control in optical parameters of its constituent layers. In order to design DBR, two porous silicon single layer samples were fabricated using current density of 10 and 50 mA/cm~2. Optical characterization of single layer samples showed series of interference fringes. Reflective interferometric Fourier transform spectroscopy (RIFTS) method was employed to determine optical constants of porous silicon single layers. DBR simulation was carried out based on transfer matrix method. DBR was then fabricated using optical parameters obtained from RIFTS method. Reflection bandwidth of prepared DBR was found to be 216 nm, which is comparable to the simulated value of 203 nm.
机译:本工作报告了基于多孔硅的一维(1D)光子晶体的设计和制造。分布式布拉格反射器(DBR)是一维光子晶体,由高折射率层和低折射率层的多层堆栈组成。多孔硅DBR的设计是一项复杂的工作,需要对其组成层的光学参数进行适当的控制。为了设计DBR,使用10和50 mA / cm〜2的电流密度制作了两个多孔硅单层样品。单层样品的光学表征显示出一系列干涉条纹。采用反射干涉傅里叶变换光谱法(RIFTS)确定多孔硅单层的光学常数。基于传递矩阵法进行了DBR仿真。然后使用从RIFTS方法获得的光学参数制造DBR。发现制备的DBR的反射带宽为216nm,与203nm的模拟值相当。

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