Sidelobe reduction of tightly focused radially higher-order Laguerre-Gaussian beams using annular masks

摘要

We report the reduction of sidelobes in tight focusing patterns of radially higher-order Laguerre-Gaussian (LG) beams with nonhelical phase structures. Numerical calculations based on the vectorial Debye theory reveal that a class of annular masks reduces sidelobes in the tight focusing patterns only for radially even-order LG beams. The present scheme produces small focal spots beyond the diffraction limit suitable for application to scanning microscopy, laser fine processing, etc. (C) 2008 Optical Society of America.