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首页> 外文期刊>Optoelectronics, Instrumentation and Data Processing >The influence of a polygonal local defect on the structure of Fraunhofer diffraction pattern of a circular aperture
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The influence of a polygonal local defect on the structure of Fraunhofer diffraction pattern of a circular aperture

机译:多边形局部缺陷对圆孔夫琅和费衍射图结构的影响

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摘要

A method is proposed, which explains the scheme of forming a structure of diffraction pattern (DP) of a circular aperture in the presence of a single polygonal local defect by means of the system of patterns and terms used in geometric diffraction theory (GDT). The DP intensity modulation has a clearly pronounced local character, zones of influence of diffraction waves of defect edges (bright "beams") and darker zones of influence of waves of angular defect points (between "beams") are detected. Lines along which the minimum intensity distributions are grouped (DP structure lines) are second-order curves, the lines are local: correspond to the DP structure within "own" zone. The highest point group of symmetry for DP of an aperture with a non-central defect is 2m, the lowest is 2.
机译:提出了一种方法,该方法通过几何衍射理论(GDT)中使用的图案和术语系统解释了在存在单个多边形局部缺陷的情况下形成圆形孔径的衍射图案(DP)结构的方案。 DP强度调制具有明显明显的局部特征,检测到缺陷边缘的衍射波的影响区域(明亮的“光束”)和角度缺陷点的波的影响的较暗的区域(“光束”之间)。将最小强度分布分组的线(DP结构线)是二阶曲线,这些线是局部的:对应于“自身”区域内的DP结构。具有非中心缺陷的孔的DP的对称性的最高点组是2m,最低的是2。

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