Low Temperature Deposition of Nanocrystalline Titanium Dioxide from Titanium Tetraisopropoxide

摘要

Effect of ozone and water vapor on the chemical deposition of TiO2 from the gas phase in the system of titanium tetraisopropylate-oxygen was examined. Introduction of ozone in the reaction medium was shown to result in the precipitation of smooth TiO2 layers at 240°C, and the addition of water vapor leads to the formation with higher rate of unconsolidated layers. Adding ozone to the reaction medium with low moisture content (up to 0.65 Pa) allows obtaining at temperatures 250-350°C with high rate of growth the TiO2 layers with the anatase nanocrystals of high photocatalytic activity.