Atomic layer-by-layer construction of Pd on nanoporous gold via underpotential deposition and displacement reaction

摘要

Atomic layer-by-layer construction of Pd on nanoporous gold (NPG) has been investigated through the combination of underpotential deposition (UPD) with displacement reaction. It has been found that the UPD of Cu on NPG is sensitive to the applied potential and the deposition time. The optimum deposition potential and time were determined through potential-and time-sensitive stripping experiments. The NPG-Pd electrode shows a different voltammetric behavior in comparison to the bare NPG electrode, and the deposition potential was determined through the integrated charge control for the monolayer UPD of Cu on the NPG-Pd electrode. Five layers of Pd were constructed on NPG through the layer-bylayer deposition. In addition, the microstructure of the NPG-Pdx (x = 1, 2, 3, 4 and 5) films was probed by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and scanning transmission electron microscopy (STEM). The microstructural observation demonstrates that the atomic layers of Pd form on the ligament surface of NPG through epitaxial growth, and have no effect on the nanoporous structure of NPG. In addition, the hydrogen storage properties of the NPG-Pdx electrodes have also been addressed.