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The corrosion inhibition effect of aryl pyrazolo pyridines on copper in hydrochloric acid system: computational and electrochemical studies

机译:芳基吡唑并吡啶对盐酸体系中铜的缓蚀作用:计算和电化学研究

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The inhibition effect of three aryl pyrazole pyridine derivatives namely: 3-methyl-6-oxo-4,5,6,7-tetrahydro-2H-pyrazolo[3,4-b]pyridine-5-carbonitrile (APP I), 3-methyl-6-oxo-4-(3-phenoxyphenyl)-4,5,6,7-tetrahydro-2H-pyrazolo[3,4-b]pyridine-5-carbonitrile (APP II) and 3-methyl-6-oxo-4-(thiophen-2-yl)-4,5,6,7-tetrahydro-2H-pyrazolo[3,4-b]pyridine-5 carbonitrile (APP III) against the corrosion of copper in 0.5 M HCl solution has been systematically investigated by electrochemical impedance spectroscopy, potentiodynamic polarization measurements and quantum chemical methods. A good correlation between the computed energy gap, omega E, data and the experimental inhibition efficiencies was found. Potentiodynamic polarization measurement results indicate that all three APPs derivatives are cathodic type inhibitors. Among the studied compounds, APP I exhibited the best inhibition activity 92.3% at 1.59 mmol/L. The scanning electron microscopy (SEM) and energy-dispersive X-ray (EDX) spectroscopy confirmed the presence of inhibitors on the copper surface.
机译:三种芳基吡唑吡啶衍生物的抑制作用:3-甲基-6-氧代-4,5,6,7-四氢-2H-吡唑并[3,4-b]吡啶-5-甲腈(APP I),3 -甲基-6-氧代-4-(3-苯氧基苯基)-4,5,6,7-四氢-2H-吡唑并[3,4-b]吡啶-5-腈(APP II)和3-甲基-6 -oxo-4-(噻吩-2-基)-4,5,6,7-四氢-2H-吡唑并[3,4-b]吡啶-5腈(APP III)对铜在0.5 M HCl中的腐蚀解决方案已通过电化学阻抗谱,电位动力学极化测量和量子化学方法进行了系统研究。发现计算的能隙,ωE,数据与实验抑制效率之间具有良好的相关性。电位动力极化测量结果表明,所有三种APPs衍生物均为阴极型抑制剂。在研究的化合物中,APP I在1.59 mmol / L时表现出最佳的抑制活性,为92.3%。扫描电子显微镜(SEM)和能量色散X射线(EDX)光谱证实了铜表面上存在抑制剂。

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