首页> 外文期刊>Radiation Physics and Chemistry >Interaction of highly charged ions with insulator surfaces
【24h】

Interaction of highly charged ions with insulator surfaces

机译:高电荷离子与绝缘子表面的相互作用

获取原文
获取原文并翻译 | 示例
       

摘要

Selected aspects of the interaction of slow,highly charged ions with insulating surfaces are presented:the electron emission from the interaction of highly charged Ne~(9+)ions with thin SiO_2 films and the calorimetric determination of the potential energy retention in these layers.The results are compared to the interaction of highly charged ions with metallic Au and n-type Si(l 00)surfaces.In addition,a short overview of the interaction scenario of HCIs with insulating surfaces is given in the context of more applicative aspects of the interaction of HCIs with insulators like potential sputtering and single ion induced surface modifications.
机译:介绍了慢速,高电荷离子与绝缘表面相互作用的某些方面:高电荷的Ne〜(9+)离子与SiO_2薄膜相互作用产生的电子发射以及这些层中势能的量热法测定。将结果与高电荷离子与金属Au和n型Si(l 00)表面的相互作用进行了比较。此外,在HCI的更多应用方面,简要概述了HCl与绝缘表面的相互作用。 HCl与绝缘体的相互作用,例如电势溅射和单离子诱导的表面改性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号