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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >In situ monitoring of kinetics of charged thiol adsorption on gold using an atomic force microscope
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In situ monitoring of kinetics of charged thiol adsorption on gold using an atomic force microscope

机译:使用原子力显微镜原位监测带电硫醇在金上的吸附动力学

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摘要

The adsorption of a charged thiol (HSC10COO-) on gold from its aqueous solutions of different concentration was monitored in situ by probing the surface charge. This was accomplished by measuring the interfacial forces between a modified (with a negatively charged silica sphere) tip of an atomic force microscope and the thiol-adsorbed gold surface as a function of adsorption time. The surface charge and potential were then deduced from the force data. If a Langmuir rate law is employed to fit the overall surface coverage vs time data, average observed adsorption rate constants of 0.045 +/- 0.005 (0.5 mM) and 0.020 +/- 0.003 (0.05 mM) min(-1) were obtained and were dependent on thiol concentration. The self-assembly process was a two-step process, an initial fast step followed by a slow step. [References: 36]
机译:通过探测表面电荷原位监测带电硫醇(HSC10COO-)从金的不同浓度水溶液中的吸附。这是通过测量原子力显微镜的改性(带负电荷的二氧化硅球)尖端与硫醇吸附的金表面之间的界面力(随吸附时间变化)而实现的。然后从力数据推导出表面电荷和电势。如果采用Langmuir速率定律来拟合总表面覆盖率与时间数据,则平均观察到的吸附速率常数为0.045 +/- 0.005(0.5 mM)和0.020 +/- 0.003(0.05 mM)min(-1),并且取决于硫醇浓度。自组装过程分为两步,首先是快速步,然后是慢步。 [参考:36]

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