首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >ABSOLUTE SURFACE DENSITY OF THE AMINE GROUP OF THE AMINOSILYLATED THIN LAYERS - ULTRAVIOLET-VISIBLE SPECTROSCOPY, SECOND HARMONIC GENERATION, AND SYNCHROTRON-RADIATION PHOTOELECTRON SPECTROSCOPY STUDY
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ABSOLUTE SURFACE DENSITY OF THE AMINE GROUP OF THE AMINOSILYLATED THIN LAYERS - ULTRAVIOLET-VISIBLE SPECTROSCOPY, SECOND HARMONIC GENERATION, AND SYNCHROTRON-RADIATION PHOTOELECTRON SPECTROSCOPY STUDY

机译:氨基甲硅烷基化的薄层中胺基团的绝对表面密度-紫外可见光谱,第二次谐波生成和同步辐射-光电子光谱研究

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The surface of a fused silica and oxidized silicon wafer (SiO2/Si(100)) was treated with (3-aminopropyl)triethoxysilane (1), (3-aminopropyl)diethoxymethylsilane (2), and (3-aminopropyl)ethoxydimethylsilane (3) for 72 h in solution. Thickness of the aminosilylated film out of 1 increases rapidly, and it turns out to be around 100 A in 72 h. Rather slow increase of the thickness is observed for 2, which produces the layers of 8 and 14 Angstrom in 10 and 72 h, respectively. The reagent 3 produces the monolayers of constant thickness 7-8 Angstrom during the whale span of the reaction. The aminosilane layer was allowed to react with 4-nitrobenzaldehyde to form an imine, and absorbance (A(surf)) of the imine was recorded by UV-vis spectroscopy. The imine was hydrolyzed in a known volume of water to produce 4-nitrobenzaldehyde, and subsequently its absorbance was measured. Thus observed number of the aldehyde molecules is equivalent to the number of the imine molecules on the surface. With the known surface area of the substrates, the absolute surface density of the imine, that is, the reactive amine group on the surface, was calculated. At an early stage of the aminosilylation with 2, a surface density of 3.9 amine groups per 100 Angstrom(2) was measured. A relatively low value was observed for 3. It is also observed that 1 produces a multilayer with rough surface morphology, of which surface density increases sharply by the reaction time. Tilt angle of the imine was estimated from the A(surf) and the absolute surface density. The angles vary among 23-47 degrees depending on the reaction condition. Second harmonic generation of a laser light of 1064 nm was observed for the imine-formed substrates. X-ray photoelectron spectroscopy utilizing a synchrotron radiation source, in particular for the N(1s) binding energy region, confirmed the chemical transformation. Also, it is observed that the nitro group of the imine is cleaved by X-rays. [References: 44]
机译:用(3-氨基丙基)三乙氧基硅烷(1),(3-氨基丙基)二乙氧基甲基硅烷(2)和(3-氨基丙基)乙氧基二甲基硅烷(3)处理熔融石英和氧化硅晶片(SiO2 / Si(100))的表面)在溶液中放置72小时。氨基甲硅烷基化膜中的1层厚度迅速增加,在72小时内达到100 A左右。对于2观察到厚度的缓慢增加,分别在10和72小时内产生了8埃和14埃的层。在反应的鲸鱼跨度期间,试剂3产生恒定厚度为7-8埃的单层。使氨基硅烷层与4-硝基苯甲醛反应形成亚胺,并通过UV-可见光谱法记录亚胺的吸光度(A(surf))。亚胺在已知体积的水中水解产生4-硝基苯甲醛,然后测量其吸光度。因此,所观察到的醛分子的数量等于表面上的亚胺分子的数量。利用已知的基材表面积,计算出亚胺的绝对表面密度,即表面上的反应性胺基。在与2进行氨基硅烷化的早期,每100埃(2)测得3.9个胺基的表面密度。对于3观察到相对较低的值。还观察到1产生具有粗糙表面形态的多层,其表面密度随着反应时间急剧增加。从A(surf)和绝对表面密度估计亚胺的倾斜角。角度根据反应条件在23-47度之间变化。对于亚胺形成的基板,观察到1064 nm激光的二次谐波产生。 X射线光电子能谱利用同步辐射源,特别是对于N(1s)结合能区域,证实了化学转化。此外,观察到亚胺的硝基被X射线切割。 [参考:44]

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