机译:Cu(111)表面生长的超薄外延氧化铝层的光电子能谱研究
Advanced Electronic Materials Center, National Institute for Materials Science, 3-13 Sakura, Tsukuba, 305-0003, Japan;
rnSincrotrone Trieste SCpA, Strada Statale 14, km 163.5, 34149 Basovizza-Trieste, Italy;
rnAdvanced Electronic Materials Center, National Institute for Materials Science, 3-13 Sakura, Tsukuba, 305-0003, Japan;
rnCharles University, Faculty of Mathematics and Physics, V Holesovickach 2, 180 00 Prague 8, Czech Republic;
rnSincrotrone Trieste SCpA, Strada Statale 14, km 163.5, 34149 Basovizza-Trieste, Italy;
rnCharles University, Faculty of Mathematics and Physics, V Holesovickach 2, 180 00 Prague 8, Czech Republic;
X-ray photoelectron spectroscopy; low energy electron diffraction (LEED); aluminum oxide; aluminum; copper; oxide films; metal-oxide interfaces;
机译:ZnO(0001),CuCl(111)和Cu2O(111)3d(10)金属离子表面上的羰基键合:CO / Cu2O(111)的光电子能谱和电子结构计算
机译:Si(111)-(根3 x根3)R30度B表面上超薄CuPc层的光电子能谱研究
机译:Si(111)上超薄Ni层的初始生长过程和外延生长NiSi_2的电子结构
机译:沉积在FCC晶体的(111)表面上的外延单层的能量学:在Au(111)上施加到Cu单层
机译:银(001)和银(111)上超薄外延铬和氧化铁膜的生长和结构:通过X射线光电子衍射和低能电子衍射完成的综合研究。
机译:在Si(111)7×7上生长具有极性和非极性表面的KCl超薄膜
机译:si(111)上超薄Ni层的初始生长过程和外延生长的Nisi2的电子结构