首页> 外文期刊>Journal of computational electronics >Theoretical investigation of the charges weight between interface and the oxygen traps in barrier layer on the 2DEG density of Al2O3/AlGaN/GaN HEMTs
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Theoretical investigation of the charges weight between interface and the oxygen traps in barrier layer on the 2DEG density of Al2O3/AlGaN/GaN HEMTs

机译:Al2O3/AlGaN/GaN HEMTs2DEG密度阻隔层界面与氧阱之间的电荷重量理论研究

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摘要

Unintentional impurities like oxygen introduced into the undoped AlGaN barrier may present an important traps source for these devices besides /AlGaN interface traps. Here, we present a theoretical study of the charges weight between oxygen traps in barrier layer and /AlGaN interface traps on the 2DEG density for different gate bias. In order to conduct this study, a semi-analytical 1D charge model has been developed and used based on the nonlinear Poisson and Schrodinger coupled equations. The model is based on a new analytical expression of the electric field distribution under the gate including the ionized oxygen profile into the AlGaN barrier. A secondary ion mass spectrometry and deep-level transient spectroscopy measurements on a fabricated device were performed. A mean density of oxygen up to was measured into the AlGaN barrier, associated with an activation energy of 0.44 eV and a cross section of 1.4 . Using these values as the model inputs, the theoretical results showed that even with changing the balance between the interface states density and the barrier traps density, there is no an absolute traps domination either from the barrier or the interface traps and their impact weight on the 2DEG density changes with the gate bias.
机译:除了 /AlGaN 界面陷阱之外,无意中引入的氧气等杂质可能会成为这些器件的重要陷阱源。本文对不同栅极偏置下2DEG密度下势垒层中的氧阱和/AlGaN界面阱之间的电荷权重进行了理论研究。为了进行这项研究,开发并使用了基于非线性泊松和薛定谔耦合方程的半解析一维电荷模型。该模型基于栅极下电场分布的新解析表达式,包括进入 AlGaN 势垒的电离氧分布。在制造的器件上进行了二次离子质谱和深级瞬态光谱测量。在AlGaN势垒中测量了氧的平均密度,活化能为0.44 eV,横截面为1.4。以这些值为模型输入,理论结果表明,即使改变界面状态密度和屏障陷阱密度之间的平衡,屏障或界面陷阱均不存在绝对的陷阱优势,并且它们对2DEG密度的冲击权重随栅极偏置而变化。

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