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The effect of strain on the resistivity of indium tin oxide films prepared by pulsed laser deposition

机译:应变对脉冲激光沉积制备的氧化铟锡薄膜电阻率的影响

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摘要

The piezoresistivity of thin films of indium tin oxide prepared by pulsed laser deposition has been measured as a function of processing parameters. The thickness of the films ranged from 200 to 1200 nm. Resistivity and strain sensitivity measurements as a function of laser deposition parameters are reported. Gauge factors, defined as the ratio of the fractional resistance change to the applied strain, were observed to vary from approximately 0.2 for deposition in vacuum to as large as -14.7 for deposition with a residual atmosphere of 50 mTorr of oxygen. The response of gauges to strains up to the measurement limit of approximately 220 με was both linear and free of hysteresis. This fabrication strategy makes possible the direct deposition of sub-mm strain gauges onto surfaces and components, including those of micro electromechanical systems.
机译:通过脉冲激光沉积制备的氧化铟锡薄膜的压阻率已作为加工参数的函数进行测量。薄膜的厚度范围为200至1200nm。报告了电阻率和应变灵敏度测量值与激光沉积参数的函数关系。据观察,标距因子(定义为分数阻力变化与施加应变的比率)变化不等,从真空沉积的约 0.2 到残余氧气为 50 mTorr 的沉积的 -14.7 不等。真空计对高达约220 με测量极限的应变的响应是线性的,并且没有滞后。这种制造策略使得亚毫米级应变片直接沉积到表面和组件上成为可能,包括微机电系统的表面和组件。

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