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MICROSTRUCTURE AND MECHANICAL PROPERTIES OF ELECTRODEPOSITED THIN NICKEL FILMS

机译:电沉积薄镍薄膜的组织和力学性能

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摘要

We present the results of the experimental investigation of the influence of the thickness of thin nickel films on their microstructure and mechanical properties. As the thickness of the films decreases, the deposits become more fine-grained, structurally defective and stronger. At the same time, they are characterized by higher internal stresses and smaller relative elongation. The coatings deposited by pulse currents are 2-2.5 times stronger than the coatings deposited by direct currents and the stabilization of their microstructural parameters is completed at a thickness of 4-5 mu m. Hence, the thickness of nickel coatings deposited by pulse currents can be decreased to the indicated values.
机译:我们提出了镍薄膜厚度对其微观结构和机械性能影响的实验研究结果。随着膜厚度的减小,沉积物变得更细粒度,结构缺陷并且更坚固。同时,它们的特征在于较高的内应力和较小的相对伸长率。通过脉冲电流沉积的涂层比通过直流电流沉积的涂层强2-2.5倍,并且在4-5μm的厚度下完成了其微观结构参数的稳定化。因此,可以将通过脉冲电流沉积的镍涂层的厚度减小到指示值。

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