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Evolution of interlayer coupling in twisted molybdenum disulfide bilayers

机译:扭曲的二硫化钼双层中层间耦合的演化

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Van der Waals coupling is emerging as a powerful method to engineer physical properties of atomically thin two-dimensional materials. In coupled graphene-graphene and graphene-boron nitride layers, interesting physical phenomena ranging from Fermi velocity renormalization to Hofstadter's butterfly pattern have been demonstrated. Atomically thin transition metal dichalcogenides, another family of two-dimensional-layered semiconductors, can show distinct coupling phenomena. Here we demonstrate the evolution of interlayer coupling with twist angles in as-grown molybdenum disulfide bilayers. We find that the indirect bandgap size varies appreciably with the stacking configuration: it shows the largest redshift for AA- and AB-stacked bilayers, and a significantly smaller but constant redshift for all other twist angles. Our observations, together with ab initio calculations, reveal that this evolution of interlayer coupling originates from the repulsive steric effects that leads to different interlayer separations between the two molybdenum disulfide layers in different stacking configurations.
机译:范德华耦合技术正在成为一种强大的方法,可以对原子薄的二维材料的物理性质进行工程设计。在偶合的石墨烯-石墨烯和石墨烯-硼氮化物层中,已证明了有趣的物理现象,包括费米速度重正化到霍夫施塔特的蝴蝶图案。另一类二维层状半导体原子薄过渡金属二卤化硅可以显示出独特的耦合现象。在这里,我们演示了在成膜的二硫化钼双层膜中具有扭转角的层间耦合的演化。我们发现,间接带隙的大小随堆叠结构的变化而显着变化:对于AA和AB堆叠的双层,它显示出最大的红移,而对于所有其他扭曲角,则显示出明显较小但恒定的红移。我们的观察结果以及从头算计算结果表明,层间耦合的这种演化源自排斥性空间效应,这种排斥性空间效应导致在不同堆叠结构中两个二硫化钼层之间的层间分隔不同。

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