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Electronic Properties of Microscale Reduced Graphene Oxide Patterned by Micromolding

机译:通过微成型构图的微米级还原氧化石墨烯的电子性质

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摘要

Highly uniform reduced graphene oxide (rGO) array patterns with both stripe and square shapes have been fabricated on various substrates using PDMS based soft lithography. Morphology, structure and electrical properties of the GO patterns before and after annealing at 800 ℃ in H_2 atmosphere were investigated. The conductivity and carriers mobilities of the rGO patterns were improved by four orders after H_2-reduction. Temperature-dependent electrical measurements showed that charge transport occurs via a variable range hopping mechanism.
机译:具有条纹和正方形形状的高度均匀的还原氧化石墨烯(rGO)阵列图案已使用基于PDMS的软光刻技术制造在各种基板上。研究了H_2气氛中800℃退火前后GO图案的形貌,结构和电学性质。 H_2还原后,rGO模式的电导率和载流子迁移率提高了四个数量级。与温度有关的电学测量表明,电荷传输是通过可变范围跳变机制发生的。

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