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Atomic force microscopy nanotribology study of oligothiophene self-assembled films

机译:寡聚噻吩自组装膜的原子力显微镜纳米摩擦学研究

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The oligothiophene derivative 4-(5""-tetradecyl-[2, 2'; 5', 2"; 5", 2'"; 5"', 2""] pentathiophen-5-yl)-butyric acid (C14-5TBA) was synthesized and the structural and mechanical properties of self-assembled monolayers on mica have been studied by atomic force microscopy (AFM). The films were prepared by drop casting a dilute THF solution (1 mM) of the oligothiophene on mica. Islands containing primarily monolayers with a very small percentage of multilayers were formed. The molecules adsorb through the carboxylic group, and expose the alkyl chain (CH_2)_(13)CH_3. High resolution AFM scans reveal a well ordered structure of molecules with unit cell dimensions of 0.65 and 0.46 nm. Applying load to the tip, the molecular film was gradually compressed from an initial height of 4.1 nm to a final one of 2.6 nm, corresponding to a tilt of the alkyl chains. In regions covered with bilayers the molecules in the second layer were oriented opposite to those in the first layer, thus exposing the carboxylic end group to the air. This second layer was easily removed as the tip pressure increased.
机译:低聚噻吩衍生物4-(5“”-十四烷基-[2,2'; 5',2“; 5”,2'“; 5”',2“”]五噻吩-5-基)-丁酸(C14 -5TBA)的合成,并通过原子力显微镜(AFM)研究了云母上自组装单分子膜的结构和力学性能。通过在云母上滴铸寡噻吩的稀THF溶液(1 mM)来制备薄膜。形成了主要包含单层且具有非常小的多层百分比的岛。分子通过羧基吸收,并暴露出烷基链(CH_2)_(13)CH_3。高分辨率原子力显微镜(AFM)扫描揭示了分子结构良好的分子,其晶胞尺寸为0.65和0.46 nm。向尖端施加载荷,分子膜从4.1 nm的初始高度逐渐压缩到2.6 nm的最终高度,对应于烷基链的倾斜。在被双层覆盖的区域中,第二层中的分子与第一层中的分子相反,从而使羧基端基暴露于空气中。随着尖端压力的增加,第二层很容易去除。

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