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Pulsed electrodeposition into AAO templates for CVD growth of carbon nanotube arrays

机译:脉冲电沉积到AAO模板中以用于碳纳米管阵列的CVD生长

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摘要

Anodic aluminium oxide (AAO) templates for multi-walled carbon nanotube (MWCNT) growth were produced by anodization of aluminium followed by pulse-reverse electrodeposition of cobalt inside the AAO pores. Cobalt functioned as the catalyst for H-2/C2H2 chemical vapour deposition (CVD) growth of fairly well graphitized MWCNTs initiating inside the majority of the AAO pores and quickly growing beyond the pore confines. A technique is introduced for the production of AAO templates that fill evenly during pulsed electrodeposition. the electrodeposition produced an active metallic catalyst in the pore bottoms, with minimal over-filling. This process also eliminates the reduction step necessary when alternating current (AC) electrodeposition is used for filling AAO pores.
机译:通过对铝进行阳极氧化,然后在AAO孔内进行钴的脉冲反向电沉积,可生产用于多壁碳纳米管(MWCNT)生长的阳极氧化铝(AAO)模板。钴起着相当好的石墨化的MWCNT的H-2 / C2H2化学气相沉积(CVD)生长的催化剂的作用,该碳纳米管在大多数AAO孔内引发并迅速生长超出孔范围。引入了一种用于生产在脉冲电沉积过程中均匀填充的AAO模板的技术。电沉积在孔底产生了一种活性金属催化剂,并且过度填充最少。当使用交流电(AC)填充AAO孔时,此过程也消除了必要的还原步骤。

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