NC-AFM 2006: Proceedings of the 9th International Conference on Non-contact Atomic Force Microscopy

摘要

The advent of scanning probe microscopy (SPM) in the 1980s has significantly promoted nanoscience and nanotechnology. In particular, non-contact atomic force microscopy (NC-AFM), one of the SPM family, has unique capabilities with high spatial resolution for nanoscale measurements in vacuum, air and liquids. In the last decade we have witnessed the rapid progress of NC-AFM with improved performance and increasing applications. A series of NC-AFM international conferences have greatly contributed to this field. Initiated in Osaka in 1998, the NC-AFM meeting has been followed by annual conferences at Pontresina, Hamburg, Kyoto, Montreal, Dingle, Seattle and Bad Essen. The 9th conference was held in Kobe, Japan, 16-20 July 2006. This special issue of Nanotechnology contains the outstanding contributions of the conference. During the meeting delegates learnt about a number of significant advances. Topics covered atomic resolution imaging of metals, semiconductors, insulators, ionic crystals, oxides, molecular systems, imaging of biological materials in various environments and novel instrumentation. Work also included the characterization of electronic and magnetic properties, tip and cantilever fabrication and characterization, atomic distinction based on analysis of tip-sample interaction, atomic scale manipulation, fabrication of nanostructures using NC-AFM, and related theories and simulations. We are greatly impressed by the increasing number of applications, and convinced that NC-AFM and related techniques are building a bridge to a future nano world, where quantum phenomena will dominate and nano devices will be realized. In addition, a special session on SPM road maps was held as a first trial in the field, where the future prospects of SPM were discussed enthusiastically.