An approach to fabrication of a patterned magnetic recording medium for next generation data storage systems is presented. (Co/Pd)_n magnetic multilayers are evaluated as candidates for patterned medium materials for their high and easily controllable magnetic anisotropy. The multilayer films deposited on a Ta seed layer enable high intergranular exchange coupling-an essential feature of a patterned magnetic recording medium. The quality of (Co/Pd)_n superlattices was optimized via deposition conditions and monitored using low-angle x-ray diffraction. An estimated in-plane (hard-axis) magnetization saturation field in excess of 40 000 Oe was observed. Vertical (easy-axis) hysteresis loops for as-deposited continuous magnetic multilayers exhibited a low coercivity of 930 Oe, indicating highly uniform (magnetically) films with weak domain wall pinning. Ion-beam proximity lithography was used to pattern magnetic multilayers into 43 nm islands on a 135 nm pitch. Following patterning, easy-axis coercivity increased nearly 15-fold to 12.7 kOe.
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