Silicon nanophases are grown in fused silica using an ion implantation technique followed by a thermal and swift heavy ion irradiation induced annealing process. From an estimation of the track cooling time and nanoprecipitation nucleation time for the present experiment, it is inferred that nanoprecipitation occurs inside the swift heavy ion induced latent tracks. The blue shift of the photoluminescence peak as well as the UV/visible absorption band edge for swift heavy ion induced annealing indicate the occurrence of nanoprecipitation inside the track.
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