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The nanostructured phase transition of superhard Ti-Si-C-N coatings

机译:超硬Ti-Si-C-N涂层的纳米结构相变

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摘要

Ti-Si-C-N coatings with different Si contents were synthesized by means of pulsed direct current plasma-enhanced chemical vapor deposition using a TiCl4, SiCl4, CH4, N-2, H-2 and Ar gas mixture. A complex phase transition has been identified which is strongly controlled by the silicon content in the coatings. Transmission electron microscopy (TEM) and x-ray diffraction (XRD) results indicate that increasing Si content leads to a phase transition from a solid solution (Ti, Si)(C, N) to a dual-phase Ti (C, N) + TiSi2 structure, and then to a two-phase Ti (C, N) + SiC structure, and that the changes in grain size and lattice parameter coincide with the phase transition. The Ti-Si-C-N coatings with high Si contents (>= 4.3 at.%) possess a superhigh hardness (43-52 GPa) due to grain refinement/grain boundary hardening and compressive stress/dispersion hardening of the hard, nanosized crystalline TiSi2 or SiC dispersed in the matrix.
机译:利用TiCl4,SiCl4,CH4,N-2,H-2和Ar气体混合物通过脉冲直流等离子体增强化学气相沉积法合成了不同Si含量的Ti-Si-C-N涂层。已经确定了复杂的相变,其受涂层中硅含量的强烈控制。透射电子显微镜(TEM)和X射线衍射(XRD)结果表明,增加的Si含量导致从固溶体(Ti,Si)(C,N)到双相Ti(C,N)的相变+ TiSi2结构,然后转变为两相Ti(C,N)+ SiC结构,并且晶粒尺寸和晶格参数的变化与相变一致。具有高Si含量(> = 4.3 at。%)的Ti-Si-CN涂层由于晶粒细化/晶粒边界硬化以及硬质纳米晶态TiSi2的压缩应力/分散硬化而具有超高硬度(43-52 GPa)或SiC分散在基体中。

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