Nanopatterning of plasma polymer reactive surfaces by DUV interferometry

摘要

A new method is described for producing patterned solid surfaces with reactive groups. This entails pulsed plasma deposition of anhydride functionalized films, followed by the covalent attachment of an amine-terminated nucleophile via aminolysis reaction. Characterization of the surface chemistry was achieved by XPS, PM-IRRAS and contact angle measurement. Patterning was achieved by DUV irradiation using an ArF excimer laser and an interferometric set-up. Well-defined patterns have been obtained at different scales on a large surface area and using this unique procedure. Spectroscopic characterizations coupled with AFM measurements allow explanation to some measure of the photoinduced phenomena. Trenches with a width ranging from 75 to 500 nm and a depth up to 30 nm were written. Using this approach it is possible to create combinatorial patterned surfaces with well-controlled topography and chemistry.