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Hydrogen adsorption on boron doped graphene: an ab initio study

机译:氢在硼掺杂石墨烯上的吸附:从头算研究

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摘要

(i) The electronic and structural properties of boron doped graphene sheets, and (ii) the chemisorption processes of hydrogen adatoms on the boron doped graphene sheets have been examined by ab initio total energy calculations. In (i) we find that the structural deformations are very localized around the boron substitutional sites, and in accordance with previous studies (Endo et al 2001 J. Appl. Phys. 90 5670) there is an increase of the electronic density of states near the Fermi level. Our simulated scanning tunneling microscope (STM) images, for occupied states, indicate the formation of bright (triangular) spots lying on the substitutional boron (center) and nearest-neighbor carbon (edge) sites. Those STM images are attributed to the increase of the density of states within an energy interval of 0.5 eV below the Fermi level. For a boron concentration of similar to 2.4%, we find that two boron atoms lying on the opposite sites of the same hexagonal ring (B1-B2 configuration) represents the energetically most stable configuration, which is in contrast with previous theoretical findings. Having determined the energetically most stable configuration for substitutional boron atoms on graphene sheets, we next considered the hydrogen adsorption process as a function of the boron concentration, (ii). Our calculated binding energies indicate that the C-H bonds are strengthened near boron substitutional sites. Indeed, the binding energy of hydrogen adatoms forming a dimer-like structure on the boron doped B1-B2 graphene sheet is higher than the binding energy of an isolated H-2 molecule. Since the formation of the H dimer-like structure may represent the initial stage of the hydrogen clustering process on graphene sheets, we can infer that the formation of H clusters is quite likely not only on clean graphene sheets, which is in consonance with previous studies (Hornekaer et al 2006 Phys. Rev. Lett. 97 186102), but also on B1-B2 boron doped graphene sheets. However, for a low concentration of boron atoms, the formation of H dimer structures is not expected to occur near a single substitutional boron site. That is, the formation (or not) of H clusters on graphene sheets can be tuned by the concentration of substitutional boron atoms.
机译:(i)掺硼石墨烯片的电子和结构性质,以及(ii)掺硼石墨烯片上氢原子的化学吸附过程已经从头计算出总能量。在(i)中,我们发现结构变形非常局限在硼取代位点附近,根据先前的研究(Endo等,2001 J. Appl。Phys。90 5670),附近的态电子密度增加费米水平。对于占据状态,我们的模拟扫描隧道显微镜(STM)图像指示出位于替代硼(中心)和最近邻碳(边缘)位点的亮(三角形)斑点的形成。这些STM图像归因于在费米能级以下0.5 eV的能量间隔内状态密度的增加。对于约2.4%的硼浓度,我们发现位于同一六角环相对位置(B1-B2构型)的两个硼原子代表了能量上最稳定的构型,这与先前的理论发现相反。确定了石墨烯片上取代硼原子的能量上最稳定的构型后,我们接下来考虑氢吸附过程与硼浓度的关系,(ii)。我们计算的结合能表明,C-H键在硼取代位点附近增强。实际上,在掺硼的B1-B2石墨烯片上形成二聚体状结构的氢原子的结合能高于分离的H-2分子的结合能。由于H二聚体状结构的形成可能代表了石墨烯片上氢团簇过程的初始阶段,我们可以推断出H团簇的形成不仅可能在干净的石墨烯片上,这与以前的研究相吻合。 (Hornekaer等人,2006 Phys.Rev.Lett.97 186102),但也在掺硼的B1-B2石墨烯片上。然而,对于低浓度的硼原子,预计在单个取代硼位点附近不会形成H二聚体结构。也就是说,可以通过取代硼原子的浓度来调节(或不可以)石墨烯片上H团簇的形成。

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