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Selection of non-alloyed ohmic contacts for ZnO nanostructure based devices

机译:基于ZnO纳米结构的器件的非合金欧姆接触的选择

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摘要

Zinc oxide (ZnO) nanorods were synthesized using a simple and economic aqueous solution method on ZnO coated p-type Si substrates. Their physical properties have been examined using appropriate techniques. These investigations showed that the as-grown ZnO nanorods on ZnO/Si are single crystalline and grown along the [001] direction. These nanostructures exhibited the rms surface roughness and activation energy of approx 16.7 nm and approx 18 meV, respectively. Stable ohmic contacts are essential for reliable operation of any electronic device. To select such contacts for ZnO nanostructures, metal contacts (M velence Ag, Al, In and Sn) were deposited on perfectly cleaned ZnO nanostructures (M/ZnO) using a thermal evaporation technique. From current versus voltage measurements, it is observed that at room temperature the M/ZnO structures except Al/ZnO exhibited nearly ohmic behaviour. With increasing temperature, the contact resistance of all M/ZnO structures except In/ZnO increased due to the formation of metallic bonds between metal and ZnO nanostructures. The annealing effect on M/ZnO structures was also studied, and their behaviour has been discussed and reported.
机译:使用简单和经济的水溶液法在ZnO涂层的p型Si衬底上合成了氧化锌(ZnO)纳米棒。已使用适当的技术检查了它们的物理性质。这些研究表明,在ZnO / Si上生长的ZnO纳米棒是单晶的,并沿[001]方向生长。这些纳米结构分别显示均方根表面粗糙度和约16.7 nm的活化能,约18 meV。稳定的欧姆接触对于任何电子设备的可靠操作都是必不可少的。为了为ZnO纳米结构选择此类接触,使用热蒸发技术将金属接触(Mvelence Ag,Al,In和Sn)沉积在完全清洁的ZnO纳米结构(M / ZnO)上。从电流对电压的测量结果可以看出,在室温下,除Al / ZnO以外的M / ZnO结构表现出几乎欧姆的行为。随着温度的升高,由于金属和ZnO纳米结构之间形成金属键,除In / ZnO之外的所有M / ZnO结构的接触电阻均增加。还研究了退火对M / ZnO结构的影响,并讨论了其行为。

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