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Low-current focused-ion-beam induced deposition of three-dimensional tungsten nanoscale conductors

机译:低电流聚焦离子束诱导的三维钨纳米尺度导体沉积

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摘要

We have used focused-ion- beam assisted chemical vapour deposition to grow 'flying' tungsten nanorods - i.e. nanoscale wiring which is not lying on the substrate surface. Flying rods of cross- sectional diameter of the order 100 nm were grown with a 1 pA gallium ion-beam current. The electrical resistivity of such flying nanorods is comparable to that of nanowires grown on the substrate surface. Such flying nanorods could be used to make electrical contact to single vertical nanocrystals.
机译:我们已经使用聚焦离子束辅助化学气相沉积法来生长“飞行的”钨纳米棒,即不位于基板表面的纳米级布线。用1 pA镓离子束电流生长横截面直径约为100 nm的飞杆。这种飞行的纳米棒的电阻率可与在基底表面上生长的纳米线的电阻率相比。这种飞行的纳米棒可用于与单个垂直纳米晶体进行电接触。

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