The method for the deposition of a substance on a substrate surface (8) by reaction of a precursor substance (12), which by irradiating a primary electron beam (2) on the substrate surface (8) is triggered, wherein the substrate surface (8) during the deposition of the secondary electrons emitted as the process signal are detected, characterized in that a difference signal between the process signal and a base signal for regulating and / or control of the primary electron beam (2) is used, with the base signal as a spatially resolved measurement signal as a time before the process signal from the substrate surface (8) is detected, said secondary electrons emitted during the meeting of the primary electron beam (2) on the substrate surface (8) without the presence of precursor substance (12), and the base signal is emitted in a data memory and stored for the calculation of the difference signal from the data memory is retrieved, and wherein the control of the localization of the primary electron beam (2) by means of a relative movement between the primary electron beam (2) and the substrate surface (8) is carried out.
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