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Gasochromic effect and relative mechanism of WO_3 nanowire films

机译:WO_3纳米线薄膜的气致变色效应及其相关机理

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摘要

WO_3 nanowire films have been prepared by thermal evaporation on both a silicon substrate and a quartz substrate. The gasochromic effect and the colouration mechanism of the films are investigated in detail by ultraviolet-visible-near infrared (UV-vis-NIR) spectroscopy, x-ray diffraction (XRD) spectroscopy, micro-Raman spectroscopy, x-ray photoelectron spectroscopy (XPS) and electrical transport measurements. The studies reveal that the gasochromism of WO_3 nanowire films is caused by hydrogen injection. Along with the injection, a part of the tungsten ions' valences and the lattice structure change, giving rise to the colouration of the films. Moreover, electrical transport measurements show the lower conductance of the coloured film, which further confirms the hydrogen injection mechanism. Finally, a gasochromic model of the WO_3 nanowire films is proposed.
机译:通过在硅衬底和石英衬底上热蒸发制备了WO_3纳米线膜。通过紫外可见近红外(UV-vis-NIR)光谱,X射线衍射(XRD)光谱,微拉曼光谱,X射线光电子能谱()来详细研究薄膜的气致变色效应和着色机理XPS)和电传输测量。研究表明,WO_3纳米线薄膜的气致变色是由注氢引起的。随着注入,一部分钨离子的化合价和晶格结构发生变化,从而引起薄膜的着色。此外,电迁移测量显示出有色膜的电导较低,这进一步证实了氢的注入机理。最后,提出了一种WO_3纳米线薄膜的气致变色模型。

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