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Controlled deposition of gold nanodots using non-contact atomic force microscopy

机译:使用非接触原子力显微镜控制金纳米点的沉积

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摘要

A technique for highly reproducible deposition of nanoscale sized gold dots in an atomic force microscopy (AFM) configuration is described. This is achieved by precisely controlling the tip-sample separation, using feedback control enabled by the application of an external electrostatic servo force. Application of a voltage pulse of either polarity to a gold coated oscillating cantilever tip leads to the deposition of the Au dot. Dimensions for the, fabricated dots are 6-100 nm in width, and < 1 - 10 nm in height. The well controlled deposition process allowed the study of dot formation and the obtaining of relevant statistics. We found that the deposition process is the field emission of Au ions. Nevertheless, threshold values obtained are higher than previously reported ones and were found to be dependent on the tip shape. Depositions are independent of substrate morphology and lithographically patterned lines formed by overlapping Au nanodots as long as 55 mu m have been fabricated.
机译:描述了一种在原子力显微镜(AFM)配置中高度可再现地沉积纳米级金点的技术。这是通过使用外部静电伺服力施加的反馈控制来精确控制尖端样品的分离来实现的。将任何极性的电压脉冲施加到镀金的振荡悬臂尖端都会导致Au点的沉积。制成的点的尺寸为宽度6-100 nm,高度<1-10 nm。良好控制的沉积过程可以研究点的形成并获得相关的统计数据。我们发现沉积过程是金离子的场发射。然而,获得的阈值高于先前报道的阈值,并且发现其取决于尖端形状。沉积与衬底形态无关,并且已经制造了由重叠的Au纳米点形成的光刻图案线,该线长至55μm。

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