A Monte Carlo Simulation of the Processes of Nanostructure Growth: The Time-Scale Event-Scheduling Algorithm

摘要

The SilSim3D program package is developed to conduct Monte Carlo simulations of the kinetics of growth, evaporation, and annealing of thin layers on solid substrates on the basis of an original algorithm of scheduling events on areal time scale. The model allows the simulation of various nanoelectronic technological processes in multicomponent physical and chemical systems of more than 107 particles in time intervals com-parable with the actual experimental times. The initial stages of atomic layer deposition and the growth of sil-icon nanowhiskers are simulated as an example.