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On the evaluation of optical parameters of a thin semiconductor film from transmission spectra, and application to GaN films

机译:从透射光谱评估半导体薄膜的光学参数及其在GaN薄膜中的应用

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摘要

The analysis of the optical transmission spectra of semiconductor thin films on a transparent substrate is revisited. A new equation for the optical transmission is derived. Based on this equation and on the spacing of the interference pattern, a method is described and analyzed in detail for the determination of the film thickness, refractive index and absorption coefficient. As a notable feature, small values of the absorption coefficient can be determined as a fitting parameter at all wavelengths, regardless of strong interference. The method is compared to the frequently encountered envelope method of Manifacier et al and Swanepoel. The suitability of the method is illustrated on two GaN thin films grown on sapphire. Below the band gap, the index of refraction of GaN can be described by the equation n(lambda(nm)) velence 2.19 + 2.57(lambda - 345)~(-1/2).
机译:重新讨论对透明基板上的半导体薄膜的光透射光谱的分析。得出了光传输的新方程。基于该方程式和干涉图案的间距,详细描述和分析了一种确定膜厚,折射率和吸收系数的方法。作为一个显着的特征,可以将小吸收系数值确定为所有波长的拟合参数,而与强干扰无关。该方法与Manifacier等人和Swanepoel经常遇到的包络法进行了比较。在蓝宝石上生长的两个GaN薄膜上说明了该方法的适用性。在带隙以下,GaN的折射率可以由方程n(λ(nm))velence 2.19 + 2.57(lambda-345)〜(-1/2)描述。

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