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Effect of residual stress on fracture in confined thin films: a discrete dislocation study

机译:残余应力对约束薄膜断裂的影响:离散位错研究

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摘要

The fracture toughness of thin metal films confined between elastic layers, a geometry prevalent in electronic packaging applications, is found to depend strongly on the metal film thickness and on residual stress. Here, a two-dimensional discrete dislocation ( DD) model is used to predict the dependence of fracture toughness on both residual stress and film thickness. The fracture toughness is found to be nearly independent of cohesive strength once the cohesive strength exceeds similar to 900 MPa, and predictions for systems with nearly zero residual stress agree well with experiments. The fracture toughness is found to decrease significantly with increasing residual stress, and again the predictions are in qualitative agreement with experiments. The DD model predicts that the effect of residual stresses is independent of the sign of the stress, tension versus compression, in contrast to continuum plasticity models. Overall, this study demonstrates the power of dislocation-based modelling to handle multiple scale-dependent plasticity phenomena simultaneously.
机译:发现限制在弹性层之间的金属薄膜的断裂韧性,在电子包装应用中普遍存在的几何形状,在很大程度上取决于金属膜的厚度和残余应力。在这里,使用二维离散位错(DD)模型来预测断裂韧度对残余应力和膜厚的依赖性。一旦内聚强度超过类似的900 MPa,就发现断裂韧性几乎与内聚强度无关,并且对残余应力几乎为零的系统的预测与实验非常吻合。发现断裂韧性随着残余应力的增加而显着降低,并且该预测再次与实验定性一致。 DD模型预测,与连续可塑性模型相比,残余应力的影响与应力,张力与压缩的符号无关。总的来说,这项研究证明了基于位错的模型能够同时处理多个尺度相关的可塑性现象。

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