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Discrete dislocation simulations of the flattening of nanoimprinted surfaces

机译:纳米压印表面平坦度的离散位错模拟

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Simulations of rough surface flattening are performed on thin metal films whose roughness is created by nanoimprinting flat single crystals. The imprinting is carried out by means of a rigid template with equal flat contacts at varying spacing. The imprinted surfaces are subsequently flattened by a rigid platen, while the change of roughness and surface profile is computed. Attention is focused mainly on comparing the response of the film surfaces with those of identical films cleared of the dislocations and residual stresses left by the imprinting process. The aim of these studies is to understand to what extent the loading history affects deformation and roughness during flattening. The limiting cases of sticking and frictionless contact between rough surface and platen are analyzed. Results showthat when the asperities are flattened such that the contact area is up to about one third of the surface area, the loading history strongly affects the flattening. Specifically, the presence of initial dislocations facilitates the squeezing of asperities independently of the friction conditions of the contact. For larger contact areas, the initial conditions affect only sticking contacts, while frictionless contacts lead to a homogeneous flattening of the asperities due to yield of the metal film. In all cases studied the final surface profile obtained after flattening has little to no resemblance to the original imprinted surface.
机译:粗糙表面平坦化的模拟是在金属薄膜上进行的,该金属薄膜的粗糙度是通过纳米压印扁平单晶产生的。压印是通过一个刚性模板进行的,该模板具有相等的平面触点,且间距可变。压印的表面随后用刚性压板压平,同时计算粗糙度和表面轮廓的变化。注意主要集中在比较膜表面的响应与清除了压印过程留下的位错和残余应力的相同膜的响应之间。这些研究的目的是了解加载历史在扁平化过程中在多大程度上影响变形和粗糙度。分析了粗糙表面与压盘之间发生粘连和无摩擦接触的极限情况。结果表明,当粗糙面变平使得接触面积达到表面积的大约三分之一时,加载历史会强烈影响平坦度。特别地,初始位错的存在促进了与接触的摩擦条件无关的凹凸的挤压。对于较大的接触区域,初始条件仅影响粘附接触,而无摩擦接触会由于金属膜的屈服而导致凹凸均匀地变平。在所有研究的案例中,压平后获得的最终表面轮廓与原始压印表面几乎没有相似。

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