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Intrinsic room temperature ferromagnetism of silicon-doped ZnO thin films

机译:硅掺杂ZnO薄膜的本征室温铁磁性

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We report our study on the magnetic properties of Si-doped ZnO thin films fabricated by pulsed laser deposition technique. The Si-doped ZnO thin films show ferromagnetism at room temperature. The saturation magnetism increases from 0 to 2.4 emu/cc with the increasing of Si concentration up to 2%, and then decreases with further increasing of Si concentration. First-principles calculation demonstrates that the origination of ferromagnetism for Si-doped ZnO system is the two unpaired electrons of Si-2p. These unpaired electrons increase the magnetic moments which are responsible for the increasing ferromagnetism.
机译:我们报告了我们对通过脉冲激光沉积技术制备的Si掺杂ZnO薄膜的磁性的研究。掺Si的ZnO薄膜在室温下显示出铁磁性。随着Si浓度的增加直至2%,饱和磁化强度从0增加到2.4emu / cc,然后随着Si浓度的进一步增加而降低。第一性原理计算表明,掺杂Si的ZnO系统的铁磁性是Si-2p的两个不成对电子。这些不成对的电子增加了磁矩,这是铁磁性增加的原因。

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