Evactron By XEI Scientific: Evactron Decontaminators lead the way in remote plasma cleaning of electron microscopes for contamination free images and data

摘要

Introduced by XEI Scientific in 1999, the Evactron plasma cleaner provides an effective method for removing troublesome carbon contamination from electron microscopes (EMs). It was developed as a plasma cleaning system for the interior of EMs that was safe to use and used room air for oxygen chemical etching. The president of XEI discovered that a hollow cathode electrode plasma device effectively cleaned and needed less than 20 Watts of RE power for cleaning without damage from sputter etching. The Evactron technology was awarded 3 patents, and XEI began its own manufacturing of the Evactron in 2003.