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Design, optimization and simulation of a low-voltage shunt capacitive RF-MEMS switch

机译:低压并联电容性RF-MEMS开关的设计,优化和仿真

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This paper presents the design, optimization and simulation of a radio frequency (RF) micro-electromechanical system (MEMS) switch. The capacitive RF-MEMS switch is electrostatically actuated. The structure contains a coplanar waveguide, a big suspended membrane, four folded beams to support the membrane and four straight beams to provide the bias voltage. The switch is designed in standard 0.35 mu m complementary metal oxide semiconductor process and has a very low pull-in voltage of 3.04 V. Taguchi method and weighted principal component analysis is employed to optimize the geometric parameters of the beams, in order to obtain a low spring constant, low pull-in voltage, and a robust design. The optimized parameters were obtained as w = 2.5 mu m, L1 = 30 mu m, L2 = 30 mu m and L3 = 65 mu m. The mechanical and electrical behaviours of the RF-MEMS switch were simulated by the finite element modeling in software of COMSOL Multiphysics 4.3 (R) and IntelliSuite v8.7 (R). RF performance of the switch was obtained by simulation results, which are insertion loss of -5.65 dB and isolation of -24.38 dB at 40 GHz.
机译:本文介绍了射频(RF)微机电系统(MEMS)开关的设计,优化和仿真。电容式RF-MEMS开关是静电驱动的。该结构包含一个共面波导,一个大的悬浮膜,四个折叠梁以支撑该膜和四个直梁以提供偏置电压。该开关采用标准的0.35μm互补金属氧化物半导体工艺设计,具有3.04 V的极低吸合电压。采用Taguchi方法和加权主成分分析来优化光束的几何参数,以获得低弹簧常数,低吸合电压和坚固的设计。获得的优化参数为w = 2.5微米,L1 = 30微米,L2 = 30微米和L3 = 65微米。 RF-MEMS开关的机械和电气性能通过COMSOL Multiphysics 4.3(R)和IntelliSuite v8.7(R)软件中的有限元建模进行了仿真。开关的RF性能通过仿真结果获得,在40 GHz时插入损耗为-5.65 dB,隔离度为-24.38 dB。

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