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Development toward an all-silicon integrated thermal management system: the integrated MCM

机译:向全硅集成热管理系统发展:集成MCM

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摘要

A new all-silicon multichip module with integrated thermal management system is presented. Our new packaging approach combines the benefits of wafer-scale integration with the flexibility of independently fabricated and pre-tested devices, allowing the development of highly integrated systems. Wet anisotropic etching is used for the dicing of silicon integrated circuits as well as for the fabrication of the chip-receiving cavities in the silicon substrate. The etching exposes 11111 type planes in both chip and receiving surface, assuring a virtually perfect mating of the assemblage. The system is complemented with an integrated silicon heat sink, which can maintain heat fluxes in excess of 100 W/cm{sup}2.
机译:提出了一种具有集成热管理系统的新型全硅多芯片模块。我们的新封装方法结合了晶圆级集成的优势以及独立制造和预先测试的设备的灵活性,从而可以开发高度集成的系统。湿法各向异性蚀刻用于硅集成电路的切割以及硅衬底中芯片容纳腔的制造。蚀刻在芯片和接收表面上都暴露了11111型平面,从而确保了组件的完美配合。该系统还配有集成的硅散热器,可以保持超过100 W / cm {sup} 2的热通量。

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