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Simultaneous measurement of static and kinetic friction of ZnO nanowires in situ with a scanning electron microscope

机译:扫描电子显微镜同时测量ZnO纳米线的动静摩擦

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摘要

A novel method for in situ measurement of the static and kinetic friction is developed and demonstrated for zinc oxide nanowires (NWs) on oxidised silicon wafers. The experiments are performed inside a scanning electron microscope (SEM) equipped with a nanomanipulator with an atomic force microscope tip as a probe. NWs are pushed by the tip from one end until complete displacement is achieved, while NW bending is monitored by the SEM. The elastic bending profile of a NW during the manipulation process is used to calculate the static and kinetic friction forces.
机译:开发了一种新颖的静摩擦和动摩擦测量方法,并针对氧化硅晶片上的氧化锌纳米线(NWs)进行了演示。实验在配备有以原子力显微镜尖端作为探针的纳米操纵器的扫描电子显微镜(SEM)内进行。尖端从一端开始推动NW,直到实现完全位移,而SEM则监视NW弯曲。 NW在操纵过程中的弹性弯曲轮廓用于计算静摩擦力和动摩擦力。

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