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Low- and high-frequency capacitance of aluminum gallium nitride/gallium nitride heterostructures with interface traps

机译:带有界面陷阱的氮化铝镓/氮化镓异质结构的低频和高频电容

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摘要

We have studied frequency dependence of capacitance properties of aluminum gallium nitride/gallium nitride (AlGaN/GaN) heterostructures with interface traps at the AlGaN/GaN interface. We have shown that ability of charge in interface traps to respond to external measuring signal is responsible for the frequency dispersion of capacitance curves. The difference between capacitance curves measured at low and high frequencies in experimental structures is similar to the difference between simulated capacitances of the heterostructures with interface traps measured at low and high frequencies. At a high frequency when the charge in interface traps does not follow the measuring signal, the capacitance curves are only shifted in voltage compared to the curve of the structure without interface traps. But for low frequency a capacitance peak is observed. Interface traps hence contribute to experimentally observed capacitance dispersion. (C) 2014 Elsevier Ltd. All rights reserved.
机译:我们研究了在AlGaN / GaN界面处具有界面陷阱的氮化铝镓/氮化镓(AlGaN / GaN)异质结构的电容特性与频率的关系。我们已经表明,接口陷阱中的电荷响应外部测量信号的能力是电容曲线频率分散的原因。实验结构在低频和高频下测得的电容曲线之间的差异类似于在低频和高频下测得的带界面陷阱的异质结构模拟电容之间的差异。在高频下,当界面陷阱中的电荷不跟随测量信号时,与没有界面陷阱的结构的曲线相比,电容曲线仅在电压上发生偏移。但是对于低频,观察到电容峰值。因此,界面陷阱有助于实验观察到的电容色散。 (C)2014 Elsevier Ltd.保留所有权利。

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