Crystallization of Si_(3)N_(4) layers and its influences on the microstructure and mechanical properties of ZrN/Si_(3)N_(4) nanomultilayers

摘要

ZrN/Si_(3)N_(4) nanomultilayers with different layer thicknesses of Si_(3)N_(4) were synthesized to study the crystallization of Si_(3)N_(4) and its effects on the microstructure and mechanical properties of multilayers. Results indicated that influenced by the template effects of crystalline ZrN layers, amorphous Si_(3)N_(4) layers were crystallized into a rocksaltlike pseudocrystal structure when their thickness was less than 0.9 nm. Then crystallized Si_(3)N_(4) layers grew epitaxially with ZrN and formed strong columnar crystals, accompanied with a remarkable increase in hardness. When its thickness exceeds 1.1 nm, the subsequently deposited Si_(3)N_(4) grows as amorphous, blocking the epitaxial growth and leading to a quick decline of hardness.