首页> 外文期刊>Materials transactions >ATR-FTIR and Nanoindentation Measurements of PMDA-ODA Polyimide Film under Different Curing Temperature
【24h】

ATR-FTIR and Nanoindentation Measurements of PMDA-ODA Polyimide Film under Different Curing Temperature

机译:不同固化温度下PMDA-ODA聚酰亚胺薄膜的ATR-FTIR和纳米压痕测量

获取原文
获取原文并翻译 | 示例
           

摘要

ATR-FTIR apparatus is used to measure the curing rate of PMDA-ODA polyimide film in order to avoid sinusoidal interference fringe. From the corrected height method, the curing rate is found to have positive correlative trend with the curing temperature. It was shown that the curing rate under 300 deg C is 92.1 percent than that under 400 deg C for one hour. The curing degree related to the mechanical properties was further demonstrated by nanoindentation. The results show that the higher the curing rate the higher the nano-hardness and nano-modulus due to the thermal imidization of polyimide characteristic. The nano-hardness ratio of curing degree at 300 deg C over curing degree at 400 deg C is 0.89, while the nano-modulus of which is 0.95.
机译:ATR-FTIR设备用于测量PMDA-ODA聚酰亚胺薄膜的固化速率,以避免出现正弦干涉条纹。根据校正高度法,发现固化速率与固化温度呈正相关趋势。结果表明,在300℃下固化一小时的固化速率比在400℃下固化的速率高92.1%。通过纳米压痕进一步证明了与机械性能有关的固化度。结果表明,由于聚酰亚胺特性的热酰亚胺化,固化速率越高,纳米硬度和纳米模量越高。 300℃下的固化度相对于400℃下的固化度的纳米硬度比为0.89,而纳米模量为0.95。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号