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Behavior of Superficial Oxide Film at Solid-State Diffusion-Bonded Interface of Tin

机译:锡在固态扩散键合界面上的表面氧化膜行为

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The microstructure of the solid-state diffusion-bonded interface of tin has been investigated by TEM observations in order to reveal the evolution of the superficial oxide film of tin with the progress in bonding. The diffusion bonding was carried out in a vacuum chamber at bonding temperatures T_j of 373-493K and at bonding pressures P_j of 90-170 MPa (bonding time = 1.8 ks). The tensile strength of the joint was increased with bonding temperature and pressure; joints having tensile strength comparable with the base metal were obtained at T_j= 493 K at P_j = 130 MPa and at T_j = 443 K at P_j = 130 MPa. When the joint strength was much lower than the base-metal strength, an interfacial region approx 500 nm in width was observed where a number of very fine inclusions that could be regarded as tin oxide were distributed. As the joint strength increased with bonding temperature, these inclusions were coarsened, and their number density was decreased. The increase in the bonding pressure enhanced these changes in the inclusion. The rise in the joint strength with bonding temperature corresponded well with the observed change in the size and density of the inclusion.
机译:通过透射电镜观察研究了锡的固态扩散键合界面的微观结构,以揭示锡的表面氧化膜随键合进展的演变。在真空室中以373-493K的结合温度T_j和90-170 MPa的结合压力P_j进行扩散结合(结合时间= 1.8 ks)。接头的抗拉强度随着粘结温度和压力的增加而增加;在P_j = 130 MPa时,T_j = 493 K,在P_j = 130 MPa时,T_j = 443 K,获得了具有与母材相当的抗拉强度的接头。当接头强度远低于母材强度时,观察到一个宽约500 nm的界面区域,其中分布了许多可以视为氧化锡的非常细的夹杂物。随着接合强度随接合温度的增加,这些夹杂物会粗化,其数量密度会降低。结合压力的增加增强了夹杂物的这些变化。接合强度随粘结温度的升高与所观察到的夹杂物尺寸和密度的变化非常吻合。

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