Study of the growth characteristics of sputtered Cr thin films

摘要

The crystallographic texture of Cr film deposited on glass substrates is found to depend on the film thicknessdCrand the substrate temperatureTs. Without substrate preheating, only the Cr lcub;110rcub; peak was observed in the xhyphen;ray diffraction spectra for films between 60 and 400 nm in thickness. With increasingTs(by substrate preheating), the Crlcub;200rcub; peak became observable at progressively increasing intensity, whereas the intensity of the lcub;110rcub; peak decreased. Consequently the 170hyphen;nmhyphen;thick films deposited atTsge;200thinsp;deg;C are predominantly lcub;100rcub; textured. However, even for these highTsvalues (ge;200thinsp;deg;C), the lcub;110rcub; peak intensity increases with increasing film thickness. Larger film thickness values are required at higherTsfor the lcub;110rcub; texture to overcome the lcub;100rcub; texture. The grain size of the Cr films deposited on glass increases with film thickness and with substrate temperature.