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NI-P ELECTROLESS DEPOSITION WITH DIFFERENT COMPLEXING AGENTS UNDER HIGH UNIFORM AND GRADIENT MAGNETIC FIELDS

机译:高均匀磁场和梯度磁场下具有不同络合剂的Ni-P化学沉积

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摘要

Effects of a static high magnetic field of 4T on the electroless Ni-P deposition with sodium citrate and lactic acid as a complexing agent, respectively, are studied in this work. The results show that the magnetic field accelerates nickel deposition using sodium citrate as a complexing agent. On the contrary, the deposition process is retarded in case of applying lactic acid as a complexing agent. The influence of a high uniform magnetic field on nickel deposition originates from two mechanisms: a Ag mechanism and a Zeeman splitting mechanism, impacting on the complexation during electroless deposition. The composition analysis reveals that the P content in the films decreases from 8.2 to 6.99 wt.% with the increasing magnetic flux density 0 to 4T. Comparing with the phosphorous content increasing during the process of plating without magnetic field, the depositing rate of phosphorus under a magnetic field of 4T is relatively uniform. In addition, the mass of deposits under a gradient magnetic field of -79.860 T~2/m is reduced if compared with the deposits under a static magnetic field. This effect is related to the magnetization force acting in the electroless bath, i.e., additional convection is suppressed, which decreases the mass transport.
机译:在这项工作中,分别研究了4T静态高磁场对柠檬酸钠和乳酸作为络合剂的化学镀Ni-P沉积的影响。结果表明,使用柠檬酸钠作为络合剂,磁场加速了镍的沉积。相反,在使用乳酸作为络合剂的情况下,沉积过程受到阻碍。高均匀磁场对镍沉积的影响源于两个机理:银机理和塞曼分裂机理,这会影响化学镀过程中的络合。组成分析表明,随着磁通密度从0增加到4T,薄膜中的P含量从8.2 wt。%降低到6.99 wt。%。与没有磁场的电镀过程中磷含量的增加相比,在4T磁场下磷的沉积速率相对均匀。另外,与静磁场下的沉积物相比,在-79.860 T〜2 / m的梯度磁场下的沉积物质量降低了。该效果与作用于化学浴中的磁化力有关,即,抑制了对流,这降低了质量传递。

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