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Preparation, curing, and properties of boron-containing bisphenol-S formaldehyde resin/o-cresol formaldehyde epoxy resinano-SiO2 composites

机译:含硼双酚S甲醛树脂/邻甲酚甲醛环氧树脂/纳米SiO2复合材料的制备,固化及性能

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Boron-containing bisphenol-S formaldehyde resin (BBPSFR) with different amounts of nano-SiO2 by in situ formation was used to cure o-cresol formaldehyde epoxy resin (o-CFER). The curing kinetics, dynamic mechanical properties, and thermal stability of BBPSFR/o-CFERano-SiO2 composites (BCS) were investigated by differential scanning calorimetry (DSC), dynamic mechanical analysis (DMA), thermogravimetry (TG), and thermogravimetrymass spectrometry (TGMS). Morphology of nano-SiO2-containing BBPSFR and glass fiber laminates of the BCS were characterized by transmission electron microscopy (TEM) and scanning electron microscopy (SEM). The mechanical properties and electrical properties were also determined. The results showed that nano-SiO2 accelerated the curing process and decreased the curing temperature; the non-isothermal curing kinetics of the BCS can be described by the two-parameter (m, n) estak-Berggren kinetic model, and the average value of m was 0.32 and n was 1.00. The thermal stability was enhanced by the addition of nano-SiO2, especially at higher temperatures, and the residual weight increased with increasing nano-SiO2 content. Incorporation of 6 wt% of nano-SiO2 increased the impact strength from 105 to 149 kJ/m(2) and storage modulus at ambient from 6.85 to 12.7 GPa, and the TEM photograph of which showed that nano-SiO2 particles (about 50 nm) were dispersed in the matrix more uniformly. The volume resistance, R (v), and dielectric constant, epsilon, slightly increased when the nano-SiO2 content was 3 wt%.
机译:通过原位形成具有不同量的纳米SiO2的含硼双酚S甲醛树脂(BBPSFR)用于固化邻甲酚甲醛环氧树脂(o-CFER)。通过差示扫描量热法(DSC),动态力学分析(DMA),热重分析(TG)和热重分析质谱法研究了BBPSFR / o-CFER /纳米SiO2复合材料(BCS)的固化动力学,动态力学性能和热稳定性。 (TGMS)。通过透射电子显微镜(TEM)和扫描电子显微镜(SEM)表征了含纳米SiO 2的BBPSFR和BCS的玻璃纤维层压板的形态。还确定了机械性能和电性能。结果表明,纳米SiO2促进了固化过程,降低了固化温度。 BCS的非等温固化动力学可以用两参数(m,n)estak-Berggren动力学模型描述,m的平均值为0.32,n为1.00。通过添加纳米SiO2可以提高热稳定性,特别是在较高温度下,并且随着纳米SiO2含量的增加,残余重量也会增加。掺入6 wt%的纳米SiO2可将冲击强度从105提高到149 kJ / m(2),在室温下的储能模量从6.85增至12.7 GPa,其TEM照片显示纳米SiO2颗粒(约50 nm) )更均匀地分散在基质中。当纳米SiO 2含量为3wt%时,体积电阻R(v)和介电常数ε稍微增加。

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