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ENERGY TRANSFER AND ELECTRON TRANSFER DISTANCES IN HETEROPOLYSILANE LANGMUIR-BLODGETT FILMS

机译:杂聚硅氧烷朗缪尔-布洛格特薄膜中的能量转移和电子转移距离

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Energy transfer distances from polysilanes bearing alkyl groups to those bearing aromatic groups are estimated by employing heteropolysilane Langmuir-Blodgett (LB) films. In the heteropolysilane films, AL1-LB film (10 layers, poly((hydroxyhexyl)hexylsilane))/I1-LB film (n layers, insulator polymer, (isobutyl methacrylate))/AR1-LB film (10 layers, poly((hydroxyphenyl)butylsilane)), AL1 is selectively excited with 310 nm light and the fluorescence from AR1-LB film is observed, as the number of insulator layers, n, is changed. The results imply that energy does not transfer from AL1-LB film to AR1-LB film when two insulator LB layers (22 Angstrom) are inserted between the two polysilane LB films. The electron transfer distances from polysilanes to (2,2'-(2-(cholan-24-yl)-2,5-cyclohexadiene-1,4-diylidene)-bis(propanedinit rile) (TCNQ1) are also estimated by employing a heteropolysilane LB film, AL1-LB film (10 layers)/I1-LB film (insulator, n layers)/TCNQ1-LB film (10 layers). The electron transfer distance from AL1-LB film to TCNQ1-LB film is determined by observing the decomposition of AL1 (the decrease in the UV absorption) when TCNQ1-LB film is selectively exposed to UV light. It is estimated that electron transfer from AL1-LB film to TCNQ1-LB film occurs through insulators of less than 22 Angstrom thickness. [References: 45]
机译:通过使用杂聚硅烷Langmuir-Blodgett(LB)膜可以估算出从带有烷基的聚硅烷到带有芳族基团的能量转移距离。在杂聚硅烷膜中,AL1-LB膜(10层,聚((羟基己基)己基硅烷))/ I1-LB膜(n层,绝缘体聚合物,(甲基丙烯酸异丁酯))/ AR1-LB膜(10层,聚((羟基苯基)丁基硅烷)),随着绝缘体层数n的变化,AL1被310 nm光选择性激发,并观察到了来自AR1-LB膜的荧光。结果表明,当在两个聚硅烷LB膜之间插入两个绝缘体LB层(22埃)时,能量不会从AL1-LB膜转移到AR1-LB膜。聚硅烷到(2,2'-(2-(cholan-24-yl)-2,5-cyclohexadiene-1,4-diylidene)-bis(propanedinitileile)(TCNQ1)的电子转移距离也可以通过使用异质硅烷LB膜,AL1-LB膜(10层)/ I1-LB膜(绝缘体,n层)/ TCNQ1-LB膜(10层),求出从AL1-LB膜到TCNQ1-LB膜的电子转移距离。通过观察TCNQ1-LB薄膜选择性暴露于紫外光时AL1的分解(紫外线吸收的降低),可以估计电子从AL1-LB薄膜到TCNQ1-LB薄膜的传输是通过小于22埃的绝缘子发生的厚度[参考:45]

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