20 nm ULTRAFILTRATION MEMBRANE FOR TREATING SHARP PARTICLES

摘要

Porex (www.porexfiltration.com) have announced a 20 nm ultrafiltration membrane. This advanced filter technology is suited to applications such as wafer grinding where fine, abrasive silicon particles and colloidal silica particles range between 20 and 50 nm (0.02 and 0.05 μm) are present. The silicon micro-particles are very sharp and can quickly damage many types of mem- brane materials.