Surface relief grating formation in amorphous As_(40)S_(15)Se_45 and As_2S_3 films under 0.532 μm wavelength illumination

摘要

In this research we have studied the influence of λ = 0.532 μm laser light illumination on the formation and properties of surface relief gratings in amorphous As_2S_3 and As_(40)Se_(15)Se_(45) films, as well as a bulk As_2S_3 sample. The surface relief grating formation was studied for a wide range of grating periods (~1-~80 μm) for the variable thicknesses of the samples. The examination of the relief depth. ?h, and its dependence on the grating period at constant exposures shows that the impact of sample thickness could manifest itself as a shift in the optimal grating period at holographic surface relief formation (As_2S_3) and affect the process itself.