Holographic Grating Formation by Wet etching in Amorphous As_(40)Ge_(10)Se_(15)S_(30) Thin Film

摘要

0.26N NaOH solution used in these experiments are suitable for the fabrication of relief grating in As_(40)Ge_(10)Se_(15)S_(35) layers with 1 .8μm and a diffraction efficiency of 5.05%, first order of diffraction. Better results will be obtained by optimizing the etching condition.(concentration, etching time, temp, etc). On the basis of the above-presented results we conclude that As_(40)GE_(10)Se_(15)S_(35) layers can be used for industrial fabrication of the diffractive optical elements and thus as recording media for holography as well.