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Thickness Dependence of Ferroelectric Properties for Ferroelectric Random Access Memory Based on Poly(vinylidene fluoride-trifluoroethylene) Ultrathin Films

机译:基于聚偏二氟乙烯-三氟乙烯超薄膜的铁电随机存取存储器的铁电特性对厚度的依赖性

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摘要

In this work, switching characteristics of poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) copolymer films are investigated over wide ranges of thickness. It is found that the thickness dependence of the coercive field is in accordance with the classical crystallization model. The leakage current shows a higher value of 140 nC/cm(2) as the thickness of P(VDF-TrFE) film is reduced to 50nm. In addition, an electroactive interlayer has been employed to improve the ferroelectric properties of P(VDF-TrFE) film. After more than 10(6) cycles of switching, the cell still has good polarization performance at both 25 and 60 degrees C even as the thickness of P(VDF-TrFE) film is down to 50nm.
机译:在这项工作中,研究了聚偏二氟乙烯-三氟乙烯(P(VDF-TrFE))共聚物薄膜在较宽的厚度范围内的开关特性。发现矫顽场的厚度依赖性与经典结晶模型一致。当P(VDF-TrFE)膜的厚度减小到50nm时,泄漏电流显示出更高的140 nC / cm(2)值。另外,已经使用电活性中间层来改善P(VDF-TrFE)膜的铁电性能。经过超过10(6)个开关周期后,即使P(VDF-TrFE)膜的厚度降至50nm,该电池在25和60摄氏度时仍具有良好的极化性能。

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